Available Technology

3D Microfabrication of Beam Tunnels for High Power Vacuum Electronic Devices

NRL has developed a novel microfabrication process for creating highly precise, geometrically round tunnels in all-metal, photolithographically-formed structures for the purpose of transporting electron beams through vacuum electro-magnetic slow-wave circuits in the millimeter wave (mmW) and sub-mmW frequency ranges (approx. 90 GHz to over 1 THz).
Abstract: 
The Naval Research Laboratory (NRL) has developed a novel microfabrication process for creating highly precise, geometrically round tunnels in all-metal, photolithographically-formed structures for the purpose of transporting electron beams through vacuum electro-magnetic slow-wave circuits in the millimeter wave (mmW) and sub-mmW frequency ranges (approx. 90 GHz to over 1 THz). This patent-pending technique uses polymer monofilaments embedded in the photoresist to hold the shape of a beam tunnel during the UV-LIGA photolithographic process. The resulting quasi-3D structures are easily electro-formed with low-loss, high thermal conductivity metals, such as copper, to create both precise electromagnetic circuits and electron beam tunnels in a single process step. This technique can similarly create multiple beam tunnels of arbitrary cross sectional shape, waveguides, passive electromagnetic structures (e.g. filters), or a wide range of microfluidic devices.
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