Thin Film Deposition Laboratory


FLC Region

Security Lab



Picatinny Arsenal




This is a unique facility used for exploratory development and fabrication of thin films and membranes. The primary feature of this facility is a 1200 square foot Class 100 clean room. It contains multiple thin film deposition chambers, photolithography (1 micron) process equipment for imaging and developing metal and polyamide layers, anodizing and automated electrical test equipment. The Clean room is a Class 100, vertical flow facility (Class 100 = less than 100 particles of contaminant of 0.5 micron (0.000001 meter) in size per cubic meter). One room contains three vapor deposition chambers for applying thin films of metals or insulators up to 3 microns thick. Two rooms contain photolithography equipment for imaging and etching the above films with dimensional accuracy of 1 micron. The last room contains space for electrical testing of the fabricated devices. Connected externally to the Clean room are a de-ionized water plant (pure H2O) and the A/C system to control temperature and humidity.

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